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Products > WaveMaster® > Operation

WaveMaster®

Description
WaveMaster® RI
WaveMaster®
      LAB
WaveMaster®      PRO Wafer

Specifications

Operation

Software

WaveMaster®

Operation
 

WaveMaster® LAB is a highly adaptive system which is able to accomplish measurement configurations even for samples exhibiting very sophisticated wavefront properties. This is enabled by the possibility to choose the light source set up and possibly the illumination objective, the appropriate collimating objective and the right telescope for maximum exploitation of the sensor area. The instrument has the flexibility of an optical bench but with a very small footprint due to the vertical setup.

The sample can be placed into the holder and aligned using all alignment tools provided by the instrument as well as the software. Nevertheless in general only a minimum amount of sample alignment is required since the software provides very good alignment error compensation.

A large range of measurement- and analysis options are available and allow for extensive test of the sample.

WaveMaster® RI has been optimized for simplicity in use and high throughput. Therefore the system can be set up for a measurement of a specific sample very easily.

  • After inserting the telescope which has the appropriate magnification for the current sample into its collet the wavefront sensor is set to the appropriate height. The position of the wavefront sensor is defined by pre-adjusted indexing plungers and needs no fine adjustment.

  • The sample is placed into the holder and roughly aligned. In general only a minimum amount of sample alignment is required since the software provides very good alignment error compensation. Focusing is done automatically.

Wavemaster® PRO Wafer is an easy to handle tool for quality monitoring of a large number of lenses in the production process or for incoming component inspection. It can be used for the measurement of entire wafers as well as single lenses which are arranged batchwise in preloaded trays. User selectable pass and fail criteria allow for the most suitable testing conditions of each type of lens.

After loading the instrument using a tray on kinematic mount each one of the lenses is measured automatically. The results are displayed in such a way that the user is able to single out any bad lens immediately. Of course, the results are also written to an output file for later analysis and further use by other manufacturing equipment.


 

 
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