WaveMaster® Compact Universal - Wavefront and Surface Measurements with Shack-Hartmann Sensors

Wavefront and surface measurement with WaveMaster® Compact Universal
Wavefront and surface measurement with WaveMaster® Compact Universal

The WaveMaster® COMPACT Universal measures lenses in both transmission and reflection with TRIOPTICS' Shack-Hartmann sensor. It is possible to measure the wavefront and surface topography of plano, spherical and aspherical optics with one measurement system by making simple adjustments.

Key Features

  • One measurement instrument for the measurement of the wavefront and surface topography
  • High measurement speed enables high sample throughput
  • Fast and easy adaptable to different sample types
  • High precision four axes alignment sample holder for submicron position adjustment
  • Only minimum amount of sample alignment necessary when measuring series of samples
  • Real time comparison with wavefront data from master lenses or design files
  • High accuracy
  • Automatic focusing
  • The automatic positioning of the wavefront sensor and the telescope in the exit pupil
  • Point light source with different numerical apertures available (up to 0.95)
  • Vibration insensitive
  • Comprehensive software for the wavefront and surface measurement with Shack-Hartmann Sensor

Applications

The WaveMaster® Compact Universal uses its built-in Shack-Hartmann sensor to determine the following parameters:

  • Measurement of the wavefront (PV, RMS) and surface topography
  • Determination of the Zernike coefficients
  • Measurement of the Point Spread Function (PSF)
  • Measurement of the Modulation Transfer Function (MTF)
  • Measurement of the Strehl ratio
  • Wedge angle
  • Measuring the surface topography of aspherical lenses, spheres and plane surfaces
  • Radius measurement
The WaveMaster® Compact Universal works in transmission and in reflectionsensor
The WaveMaster® Compact Universal works in transmission and in reflection
The WaveMaster® Compact Universal works in transmission and in reflection