Software ImageMaster^® Production Line

Software ImageMaster^® PRO 5

The software for the MTF tester is specially designed for the use in a production line environment. ImageMaster^® PRO 5 provides a stable platform and overwhelming number of features.

The ImageMaster^® PRO 5 software uses proven algorithms for calculation of the MTF, automatic correction for spatial frequencies in offaxis positions taking into account of the sample distortion, noise reduction and provides reliable and ultra-accurate measurement results. Further features include:

• Automatic pass or fail results based on a multitude of freely selectable criteria
• Software enabling real- time images of all cameras.
• Individual setting of spatial frequencies for each camera
• Settings to enable focussing curve for onaxis and/or off-axis cameras
• Three security levels, set up files and critical functions are password protected
• Storage of lens and batch data, data analysis over Excel
• Graphical intuitive representation of the measurement data in order to detect lenses out of specification at an early stage
• Polar diagram for displaying MTF symmetry in image field

In order to meet increasing requirements of high volume lens testing, TRIOPTICS added a new software module called ImagePlane. The ImagePlane-Software module provides additional information about the optical and geometrical parameters of the sample:

• Tilt of the image plane
• Field Curvature
• Depth of focus

The additional characterisation of the sample provides valuable data to be used in the optimization of the production process.

Software ImageMaster^® PRO Wafer

The ImageMaster^® PRO Wafer-Software, except for accurate MTF-measurement, needs to fulfill further specific requirements of wafer lens testing:

• Recognition of wafer marks and control of wafer alignment
• Generation of a testing pattern depending on the wafer specification
• Integration of an optical sensor for bow measurement
• Mapping of the wafer in order to determine the FFL and the dimensions of the spacers
• Bow compensation algorithms
• Generation of appropriate masks for wafer testing

Wafer-Tray Pattern Generation

For each type of lens wafer a unique wafertray representation file has to be generated once, which is then used by the software to find the optimum measurement conditions for each single lens on wafers of the same kind.

The Wafer-Tray pattern generation module is extremely flexible and allows for easy creation of files from wafer design data or machine data. A multitude of tools for pattern processing is available and enables masking, fiducial generation, export to next manufacturing steps, etc.

ImagePlane-Display of the measurement results

Wafer-Tray Generator input mask

ImageMaster^® PRO 5 Wafer - View after measurement